This product is a high-resolution imaging objective specially designed for the soft X-ray band. It adopts a dual spherical reflector structure, which effectively eliminates spherical aberration and chromatic aberration. It is suitable for optical systems such as soft X-ray microscopy and lithography, featuring high reflectivity efficiency and high spatial resolution. With a vacuum-compatible design, it can be directly integrated into various vacuum optical experimental platforms, providing core optical support for high-precision imaging in the soft X-ray band.

This product is a core scientific research equipment developed for extreme ultraviolet (EUV) lithography technology. It adopts a dual-lens group projection optical architecture, adapts to the optical transmission characteristics of the extreme ultraviolet band, and enables high-precision pattern projection and exposure imaging.

This product adopts an orthogonal hyperboloid reflector configuration to achieve efficient focusing and collimation of soft X-ray beams. The focusing precision reaches the micro-nano level. It features excellent vacuum compatibility and allows flexible adjustment of the focal spot size. Suitable for soft X-ray light sources, microscopic imaging, material characterization and other equipment, it is the key component for beam manipulation in soft X-ray optical systems.

This product is a specialized high-resolution microscopic imaging instrument designed for the extreme ultraviolet (EUV) band. It integrates an EUV illumination system, a high-sensitivity imaging detection module, and an ultra-high vacuum optical cavity, breaking through the imaging limitations of traditional optical microscopy in the EUV band.

This product adopts a high-performance transmission optical lens assembly designed for the soft X-ray band. Optimized optical coating technology improves transmittance efficiency in the target band. Its compact structure facilitates integration, featuring excellent wavelength adaptability and stability. Vacuum compatible, it is suitable for optical systems such as beam transmission, beam splitting and imaging in the soft X-ray band, and supports core optical path construction for scientific research-grade soft X-ray experimental equipment.

This product is a high-precision thermal parameter measurement instrument designed for vacuum environments. It integrates a vacuum acquisition and maintenance system, a precision temperature control module, and high-precision heat flux and thermophysical property detection units. Under high-vacuum / ultra-high-vacuum conditions, it can accurately measure key thermal parameters of various materials, components and vacuum devices, including thermal conductivity, thermal diffusivity, thermal emissivity, contact thermal resistance, etc.

This product is an ultra-high precision temperature control core component suitable for both vacuum and atmospheric environments. Equipped with high-precision temperature sensors and closed-loop temperature control algorithms, it achieves millikelvin-level temperature control accuracy and a wide temperature adjustment range. It supports in-situ real-time temperature monitoring and dynamic regulation. Featuring a vacuum-compatible package with no additional outgassing, it is ideal for precise temperature control of various precision optics, semiconductors, and vacuum devices, ensuring stable equipment operation.

This product is a professional metering device for characterizing the outgassing properties of materials and devices in a vacuum environment. It enables accurate detection and quantitative analysis of outgassing species, outgassing rate, and total outgassing volume of solid materials, vacuum components, and optical elements under various vacuum levels and temperature conditions.

This product is a gas control component designed for ultra-high vacuum and ultra-clean experimental environments. It integrates high-precision flow valves, a purity filtration module and a pressure monitoring unit to realize ultra-clean gas delivery, precise flow regulation and stable pressure control. It is free of particulate contamination and secondary outgassing, making it suitable for scenarios with stringent gas cleanliness requirements, such as EUV/soft X-ray optical systems, vacuum coating and semiconductor manufacturing processes.